Новая публикация в Plasma Chemistry Plasma Processing
07/12/2015 KV
Tatarinov A.V., Bilera I.V., Avtaeva S.V., Shakhatov V.A., Solomakhin P.V., Maladen R., Pre´ve C., Piccoz D. Dielectric barrier discharge processing of trans-CF3CH=CHF and CF3C(O)CF(CF3)2, Their mixtures with air, N2, CO2 and analysis of their decomposition products // Plasma Chem. Plasma Process. 2015. V. 35. P 845-862. DOI 10.1007/s11090-015-9635-8.
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